The advantages of our products:

Wafer Lab. class 1000 clean room
Lower contamination
- Consistence

Mesa Junction
Breakdown voltage up to 2000V.
- Low leakage on high temperature.

Photo Mask Process
- We do not cut the glass on wafer.
- No glass cracks after dicing
- Guarantee high yield.

Low temperature etching process
- The smoothest junction you will ever see.
- Extremely low reverse leakage.
- Never snaps down when Vr applied
- Withstands high reverse surge current.
- Super quality.

High temperature glass passivation
- High operation temperature.
- High reliability.

Electro phoresis glass coating
- Not doctor blade process.
- See Illustration of comparisons

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